The EH 1000 represents the latest development in gridless ion source technology.
With over 1500 earlier generation products in the field, all carrying the Kaufman pedigree, this next generation end-hall gridless ion source delivers superior performance at lower cost, coupled with simpler maintenance and optimum reliability.
This unit utilises a robust tungsten cathode filament to provide both the plasma discharge and automatic beam neutralisation. New design features enable the source to operate for extended periods with either inert or reactive gases. Ion beam output has also been increased to 2000mA.
EH 1000HC Hollow Cathode (Filamentless) version
This unit is provided with a new design hollow cathode electron source in place of the filament. Extremely long operational times are possible and the absence of a thermionic filament promotes a very high purity thin film environment.
EH 1000HC-WC Water-Cooled version
The water-cooling provided with this unit, permits constant and low process temperatures to be maintained during the deposition process as major thermal radiation sources are eliminated. This unit is also provided with a hollow cathode as a standard feature.
Typical Applications
The EH 1000 product line produces a high current and low energy ion beam ideally suited for surface treatment and thin film growth applications which include:
Ion Beam Assisted Deposition (IBAD)
In-Situ Substrate Precleaning
Diamond Like Carbon (DLC)
Process Benefits
With its performance standards, the EH 1000 product line allows the user to optimize a process recipe to achieve the desired film properties, resulting in proven film enhancements:
Increased film adhesion
Increased film density
Control of film stoichiometry
Higher index of refraction
Low film absorption and scatter
Smooth film interfaces
Hard film abrasion resistant films
Control of film stress
Substrate surface activation
Low temperature processing on temperature sensitive materials
Spectral film stability when exposed to moisture and temperature
Advantages
Optimized operation for different gases
O2, Hydrocarbons, Xe, Ar, N2
Opened-up range of operation
Ion energies, currents and pressures
Increased reliability
Rugged connectors and cables
Field proven power supply and components
Simple gas delivery to minimize leaks
Easier and less expensive to maintain and use
Modular anode
Shielded and covered insulators and cables
Small and less weight
Operates from First Generation Ion Source controller
Drop-in replacement
Process and hardware compatible
Devised design for process flexibility and opportunity
Interchangeable and optimized process modules
Flexible range of operation of ion beam properties
Opens-up new process windows for film applications
EH 1000F Filament Version
