EH 2000 Gridless Ion Source - Ion Beam Scientific - The next generation end-hall gridless ion source from Kaufman & Robinson Inc.


	EH 400

	EH 1000

	EH 2000
		Technical Data
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The new EH 2000 is a High-Output Gridless Ion Source with performance levels suited to the larger deposition system.

Producing an impressive output of 2.5A of Ion beam current over an ion energy range of 40 – 210 eV, the EH 2000 totally outperforms its ‘first generation’ counterpart. Total redesign has resulted in significantly enhanced performance, reliability and reduced operational costs.

EH2000 Versions

EH 2000 High-Output Filamentless version
	This unit is provided with the new design of hollow cathode electron source in place of a thermionic filament. Extremely long operational times of 400 – 1000 hours are possible. In addition, water cooling and the absence of a filament significantly reduces thermal radiation to substrates and promotes a very high purity, controllable thin film environment.

Typical Applications

The EH 2000 is typically suited for installation in the larger deposition system where optimum ion beam current density is required over a large area. Its use is also beneficial where temperature sensitive substrates may be processed, or alternatively’ where precise control over process temperature may be of concern to film growth.

Process Benefits

The wider operational range of the EH 2000 Gridless Ion Source offers all of the benefits of the new KRI ion source range and also provides a number of process enhancements.

Higher deposition rates possible with low energy, high current IBAD due to higher ion to atom arrival ratio – allows shorter process cycle times
Filamentless water-cooled design promotes constant process temperatures and controlled film growth
Very long process times achievable without interruption
Simple and rapid maintenance minimises system down time

Advantages

Optimised operation for different gases
- O2, Ar, N2, Hydrocarbons, Xe
Opened-up range of operation
- Ion energies, ion currents and process pressures
Increased reliability
- Rugged connectors and cables
- Field proven power modules and components
- Gas delivery system efficiently distributes gas and minimizes leaks
Easier and less expensive to maintain and use
- Modular anode
- Enhanced magnetic circuit
- Shielded and covered insulators and cables
- Smaller and weighs less
Designed for process flexibility and opportunity
- Interchangeable and optimized process modules
  - Flexible range of operation of ion beam properties
  - Opens-up new process windows for film applications
Operates from Mark II HO power supply

Drop-in replacement
Process and hardware compatible

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