Ionbeam Scientific announce arrival of new KRI RF2100ICP ‘Plasma Source’
The new RF2100ICP Plasma Source is designed to produce a diverging high density, low energy plasma discharge, for treatment of sensitive materials which may be prone to suffering damage at higher ion energies.
The typical ion energy produced is in the range of 5 – 50 eV depending on operational pressure, with ion current output achievable of greater than 500mA. The RF2100ICP Plasma Source is provided with a direct 10-inch CF flange mount and is designed for simplified maintenance.