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 KRI EH200 gridless ion source

The EH 200 is the smallest product in the range measuring only approx. 64mm diameter x 94 mm high. Suited for where space is at a premium, in the smaller deposition system. A cost effective solution for substrate pre-cleaning or IBAD.

The EH 200 is a recent addition to the Gridless ion source range. Its high efficiency results in a very compact size, yet certainly not lacking in performance.

Continuing development of the EH Gridless ion sources has lead to the introduction of the EH 200, the smallest source in the range. Although physically small, its broad diverging ion beam is capable of providing good substrate area coverage of a relatively high ion beam current density.

Versions

 EH200F filament version

EH200F filament versionThe EH200 being of physically compact design is ideally suited for smaller deposition systems or installation where system baseplate space restrictions apply. Its physical dimensions of only 64mm dia. x 94mm high disguise its powerful potential of producing 400 mA of ion beam current over an ion energy range of 35 – 210 eV. It is suitable for use with reactive gases.

 EH200HC (filamentless) version

EH200HC hollow cathode versionThe EH200HC is supplied with a hollow cathode electron source in place of a tungsten cathode filament. This allows extremely long operational times, lower process temperatures and promotes a high purity thin film environment.

Applications

The EH200 is compatible with ion beam pre-cleaning and ion assist applications in small to medium sized deposition systems. Typical examples of suitable systems for installation would include:

Dimensions and technical data

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